Custom made High purity Sputtering target Metal Molybdenum Mo target manufacturer from China

    Molybdenum target material, molybdenum is silver-white metal, molybdenum atomic radius is 0.14nm, atomic volume is 235.5px/mol, coordination number is 8, crystal is Az-type body-centered cubic system, space group is Oh (lm3m), so far It has not been found to have a heterogeneous transformation. The lattice parameter of molybdenum at room temperature is between 0.31467~0.31475nm, which varies with impurity content.

   Molybdenum has a high melting point and ranks sixth among the natural elements. It is called a refractory metal, as shown in Table 2. The density of molybdenum is 10.23g/cm, which is about half that of tungsten (tungsten density 19.36g/cm). The thermal expansion coefficient of molybdenum is very low, 4.9×10/℃ at 20~100℃; the thermal conductivity of molybdenum is relatively high, 142.35w/(m·k). The resistivity of molybdenum is low: 5.17×-10Ω·cm at 0°C; 24.6×-10Ω·cm at 800°C; 72×-10Ω·cm at 2400°C. Molybdenum is a paramagnetic body, with 99.99% purity molybdenum having a specific magnetic susceptibility of 0.93×10cm/g at 25°C. The specific heat of molybdenum is 242.8J/(kg·k) at 25°C. Molybdenum has a relatively high hardness, with a Mohs hardness of 5 to 5.5. The heat of evaporation of molybdenum at the boiling point is 594kJ/mol; the heat of fusion is 27.6±2.9kJ/mol; the heat of sublimation at 25°C is 659kJ/mol. Molybdenum is a heating element and heat shield. It has the advantages of superior electrical and thermal conductivity, low thermal expansion coefficient, and strong corrosion resistance. 

    It is mainly used for electric vacuum devices, heating elements in high-temperature furnaces, heat insulation boards, boats, etc. Manufacture of molybdenum boats, molybdenum elements for power semiconductors, and electric vacuum light source parts. The following figure shows two typical microscopic metallographic inspection pictures of molybdenum sputtering targets, with an average particle size <100um.

     As long as you provide detailed target information, such as purity, size, tolerance requirements, and other technical requirements, we will provide you with a quotation as soon as possible and provide the fastest delivery time.

    We Produce High-Purity Sputtering Targets. Its Most Important Advantage Is That In The Process Of Physical Vapor Deposition, A Thin Film With Excellent Conductivity And Particle Minimization Can Be Obtained. The Following Table Is The Composition Analysis Certificate Of 3N5 High Purity Molybdenum Sputtering Target. The Analytical Methods Used: 1. Use ICP-OES To Analyze Metal Elements; 2. Use LECO To Analyze Gas Elements.